Please use this identifier to cite or link to this item:
https://cris.library.msu.ac.zw//handle/11408/4371
Title: | Barrier height inhomogeneities on Pd/n-4H-SiC Schottky diodes in a wide temperature range | Authors: | Gora, V.E. Auret, F.D. Danga, H.T. Tunhuma, S.M Nyamhere, C. Igumbor, E. Chawanda, A |
Keywords: | Barrier height Richardson constant 4H-SiC Barrier height inhomogeneities Schottky Barrier height |
Issue Date: | 2019 | Publisher: | Elsevier Ltd | Series/Report no.: | Materials Science and Engineering;Vol.247 | Abstract: | Barrier height inhomogeneities on Pd/n-type 4H-SiC Schottky barrier diodes in the 300–800 K temperature range have been investigated. Palladium is known to form silicide above 673 K. Temperature dependent current-voltage (I-V) characteristics were analyzed. Barrier height (BH) and ideality factor (n) were found to be strongly temperature dependent. Barrier height increased, whilst ideality factor decreased with increasing in temperature and the Richardson plot showed some deviation from linearity. This was attributed to barrier inhomogeneities at the metal-semiconductor interface which resulted in a distribution of barrier heights. From the modified Richardson plot, the modified Richardson constant, A** was found to be 155 Acm−2K−2 and 87 Acm-2 K−2 in the 300–525 K and the 550–800 K temperature ranges respectively. | URI: | https://www.sciencedirect.com/science/article/abs/pii/S0921510719301655#! http://hdl.handle.net/11408/4371 |
ISSN: | 921-5107 |
Appears in Collections: | Research Papers |
Show full item record
Page view(s)
64
checked on Nov 25, 2024
Download(s)
14
checked on Nov 25, 2024
Google ScholarTM
Check
Items in MSUIR are protected by copyright, with all rights reserved, unless otherwise indicated.